Original Research

Optimization of the plasma-assisted chemical vapour deposition of silica-like thin films at low temperatures

P. L. Crouse, J. A. Bester
Suid-Afrikaanse Tydskrif vir Natuurwetenskap en Tegnologie | Vol 15, No 1 | a628 | DOI: https://doi.org/10.4102/satnt.v15i1.628 | © 1996 P. L. Crouse, J. A. Bester | This work is licensed under CC Attribution 4.0
Submitted: 10 July 1996 | Published: 10 July 1996

About the author(s)

P. L. Crouse,, South Africa
J. A. Bester,, South Africa

Full Text:

PDF (585KB)

Share this article

Bookmark and Share

Abstract

Results pertaining to the plasma-assisted chemical vapour deposition (PACVD) of SiOᵪCᵧ thin films at room temperature using a self-biasing radio-frequency plasma reactor are presented. Response surface analysis was used for experimental design. A simple technique is illustrated for the optimizing of any physical property, subject to the constraints imposed by the apparatus and by the required values of other physical properties.

Keywords

No related keywords in the metadata.

Metrics

Total abstract views: 1251
Total article views: 1371

Reader Comments

Before posting a comment, read our privacy policy.

Post a comment (login required)

Crossref Citations

No related citations found.