Original Research

Optimization of the plasma-assisted chemical vapour deposition of silica-like thin films at low temperatures

P. L. Crouse, J. A. Bester
Suid-Afrikaanse Tydskrif vir Natuurwetenskap en Tegnologie | Vol 15, No 1 | a628 | DOI: https://doi.org/10.4102/satnt.v15i1.628 | © 1996 P. L. Crouse, J. A. Bester | This work is licensed under CC Attribution 4.0
Submitted: 10 July 1996 | Published: 10 July 1996

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P. L. Crouse,, South Africa
J. A. Bester,, South Africa

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Results pertaining to the plasma-assisted chemical vapour deposition (PACVD) of SiOᵪCᵧ thin films at room temperature using a self-biasing radio-frequency plasma reactor are presented. Response surface analysis was used for experimental design. A simple technique is illustrated for the optimizing of any physical property, subject to the constraints imposed by the apparatus and by the required values of other physical properties.


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